Skip to main content

Focused Ion Beam Facility

Techniques

  • Focused Ion Beam Scanning Electron Microscopy (FIB-SEM)
  • High spatial resolution of Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) including chemical mapping, depth profiling and 3D isotopic analysis
  • Nanofabrication
  • Site specific sample preparation for TEM
  • Site specific sample preparation for APM
  • Cross-sectional analysis
  • High resolution 3D imaging by slice and view
  • Energy dispersive x-ray analysis (EDS) in 2D and 3D
  • Electron backscatter diffraction (EBSD) in 2D and 3D
  • Transmission Kikuchi Diffraction (TKD) of foils and needles

Main instrument

Tescan LYRA3GM

  • Ion column: Cobra FIB (monoisotopic 69Ga+)
  • FIB resolution: <2/5 nm at 30 kV
  • Accelerating voltage: 0.5 kV – 30 kV
  • Probe current: 1pA – 50 nA
  • Deposition: MonoGIS with Pt reservoir
  • Nanomanipulator: SmarAct
  • Electron column: MIRA (field emission)
  • SEM resolution: 1nm at 30 kV (In-Beam SE)
  • Additional detectors: Tofwerk ToF-SIMS, Oxford EDS, Oxford EBSD

Applications

Collaborative research, training and education, consultancy

Earth Science

  • High resolution chemical and isotopic mapping of geological samples (EDS, ToF-SIMS)
  • Trace and light element mapping in 2D and 3D (ToF-SIMS)
  • Submicron site specific sample preparation for nanoscale analysis (TEM, APM, TKD)
  • Subsurface analysis of hard and soft phases (e.g. shales)

Materials Science

  • Depth profiling of layered structures
  • Nanofabrication of sub 100 nm structures
  • Cross-sectional analysis
  • Failure analysis in 2D and 3D

Chemical Science

  • High resolution imaging and chemical analysis of fuel cells, nano-particles and reaction products

Facility Contacts